Difference between revisions of "Bootstrapping methods for productive nanosystems"
From apm
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(added point on medium compact self replication) |
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* '''top down:''' conventional photolithographic methods (MEMs) | * '''top down:''' conventional photolithographic methods (MEMs) | ||
* [[exponential assembly]] (the glue in the middle?) | * [[exponential assembly]] (the glue in the middle?) | ||
| − | * compact [[self replication]] (outdated) | + | * ultra compact [[self replication]] (outdated) |
| + | * medium compact [[self replication]] on the second assembly level | ||
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* self emerging highly distributed self-replicative capabilities | * self emerging highly distributed self-replicative capabilities | ||
Revision as of 19:50, 26 March 2021
Available methods for getting towards the necessary parallelity to produce macroscopic amounts of products
- bottom up: fully parallel (and hierarchical) self assembly of atomically precise chemically pre-produced building blocks
- top down: conventional photolithographic methods (MEMs)
- exponential assembly (the glue in the middle?)
- ultra compact self replication (outdated)
- medium compact self replication on the second assembly level
- self emerging highly distributed self-replicative capabilities
Bottom up
There are at least three independent orthogonal axes where technological capability can be judged by and scaled along. These are:
- Convergent selfassembly levels
(like experimentally demonstrated in SDN: bricks to blocks then blocks to multiblocks) - Material stiffness
(SDN, protein, stiffer stuff) - Degree of introduction of positional assembly aspects
See:
