Difference between revisions of "Foldamer robot approach (incremental path)"
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* [[Positional assembly redundancy blockade]] | * [[Positional assembly redundancy blockade]] | ||
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+ | * For something similar but in the context of the direct path see: <br>[[RepRec pick-and-place robots (GemGum)]] |
Revision as of 09:32, 19 June 2023
This is about a possible sub-branch of the incremental path.
The idea here is to scale up self-assembly capabilities of various foldamer technologies quite far (yellow or orange "too big to diffuse?" star in the diagram). And only then take a turn left in the diagram to more advanced materials.
Path marked with B in the diagram.
How would that look like in reality?
There would be quite advanced bottom up-self assembled foldamer based systems on chip.
Perhaps so far so that
- bottom up positional assembly has already reached and
- top down positional assembly became possible.
Basically low performance de-novo protein and other foldamer based productive nanosystems.
Applications
This could e.g. make quite big structures usable for:
- bigger gratings for neutral atom helium matter wave microscopes
- much bigger optical gratings like on butterfly wings (structural color)
- ...
Related
- Turn left here: Robo approach
- Turn left earlier: Printer approach
- Turn left earliest: Catalysis construction kit approach
- For something similar but in the context of the direct path see:
RepRec pick-and-place robots (GemGum)