Difference between revisions of "Implosion nanofabrication"

From apm
Jump to: navigation, search
(basic page)
 
(No difference)

Latest revision as of 09:13, 2 July 2022

Implosion fabrication is a manufacturing method that allows for very small
(but not yet atomically precise) electric leads down to the low single digit nanometer scale
without the need for hard to access and/or very expensive silicon chip production lab.

While there are processes for making such small leads on silicon these are at the cutting edge (2022) and only accessible
for one-off masks for processors produced in high quantities and very expensive.
More accessible fabrication labs are still expensive (how expensive?) and much lower resolution.

Detailed summary

Below is a bullet-pointed summary from the paper:
"3D nanofabrication by volumetric deposition and controlled shrinkage of patterned scaffolds"
http://science.sciencemag.org/content/362/6420/1281

Process:

  • starting out with acrylate hydrogel base (x10 or x20 cross-linked)
  • infusion with functionalized fluorescin
  • two photon excitation links fluorescin to hydrogel (at a second site beside the functionalised one)
  • "patterning": the functionalized fluorescing is linked voxel by voxel (via reverse operated optical microscope?)
    (quite strong) anisotropic distortion can be accounted for (it's repeatable)
  • "removal": remaining fluorescin is washed out
  • repetition with differently functionalized fluorescin is possible, but contamination of the former one about 20%
  • depositing materials on the patterned active groups (via conjugation chemistries)
  • "intensification": depositing more where there already is some of the same
  • (in case of metals like silver: chelate excess metal to suppress conductivity at undesired places)
  • "shrinking": contracting hydrogel by adding hydrochloric acid or MgCl2 (only former allows next step)
  • "shrinking further": by dehydration
  • in case of metals like silver: "sintering": by repeating the optical patterning in case of deposited silver

Limits:

  • not atomically precise (surface roughness comes near, but no control over individual atoms)
  • not atomically accurate
  • no hollow voids, scaffold remains in final product
  • product not resilient to water
  • still relatively experimental (technology readiness level?)

Capabilities:

  • shrunken voxels ~50nm
  • discontinuous conductors with high conductivity
  • no overhang limitations (no layer by layer deposition involved, layer by layer exposure possible)
  • Many materials possible: metals, semiconductors, and biomolecules
  • in particular: highly conductive, 3D silver nanostructures within an acrylic scaffold (the dried hydrogel)
  • big maximal build volume (what exactly effectively after full shrinking?)
  • already very fast and can be made even faster

Related