Difference between revisions of "Non atomically precise nanomanufacturing methods"
From apm
(minimal page) |
m |
||
| Line 1: | Line 1: | ||
{{stub}} | {{stub}} | ||
| − | * classical top down photololithography for micromachinery (MEMS) | + | * classical top down photololithography for micromachinery ([[Microelectromechanic system|MEMS]]) |
* vapor deposition processes | * vapor deposition processes | ||
* galvanic production methods | * galvanic production methods | ||
Revision as of 18:08, 10 June 2021
- classical top down photololithography for micromachinery (MEMS)
- vapor deposition processes
- galvanic production methods
- two photon nanolithography
- implosion nanofabrication – (wiki-TODO: add discussion of that paper)
Related
- Top-down manufacturing
- Bootstrapping
- MEMS
- Maybe slightly off-topic: Feynman path
