Bootstrapping methods for productive nanosystems: Difference between revisions

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added point on medium compact self replication
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* '''top down:''' conventional photolithographic methods (MEMs)
* '''top down:''' conventional photolithographic methods (MEMs)
* [[exponential assembly]] (the glue in the middle?)
* [[exponential assembly]] (the glue in the middle?)
* compact [[self replication]] (outdated)
* ultra compact [[self replication]] (outdated)
* medium compact [[self replication]] on the second assembly level
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* self emerging highly distributed self-replicative capabilities
* self emerging highly distributed self-replicative capabilities

Revision as of 20:50, 26 March 2021

This article is a stub. It needs to be expanded.

Available methods for getting towards the necessary parallelity to produce macroscopic amounts of products

  • bottom up: fully parallel (and hierarchical) self assembly of atomically precise chemically pre-produced building blocks
  • top down: conventional photolithographic methods (MEMs)
  • exponential assembly (the glue in the middle?)
  • ultra compact self replication (outdated)
  • medium compact self replication on the second assembly level

  • self emerging highly distributed self-replicative capabilities

Bottom up

There are at least three independent orthogonal axes where technological capability can be judged by and scaled along. These are:

  • Convergent selfassembly levels
    (like experimentally demonstrated in SDN: bricks to blocks then blocks to multiblocks)
  • Material stiffness
    (SDN, protein, stiffer stuff)
  • Degree of introduction of positional assembly aspects

See:

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